Characteristics of Excimer-Laser-Induced Luminescence of the Ground Surface of Silica Glass
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概要
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Characteristics of excimer-laser-induced luminescence of the ground surface of synthetic fused silica containing various amounts of OH were investigated. KrF (5.0 eV) and ArF (6.4 eV) lasers with a repetition rate of 20 Hz and energy densities of 44 and 53 mJ/cm^2, respectively, were used. The luminescence spectra had peaks at 1.9, 3.5, and 2.5-3 eV. Intensity at 1.9 and 3.5 eV decreased with increasing irradiation time. The decrease of the intensity of the 1.9 eV band suggests the destruction of nonbridging oxygen-hole centers (NBOHCs;≡Si-O). The change of the luminescence around 2.5-3 eV was rather complex;the luminescence spectra approached a single Gaussian band at 2.7 eV after irradiation with both types of excimer laser for 10 min. In silica containing 90 ppm of OH, the peak intensity of the 2.7 eV band after irradiation for 10 min was stronger than the initial peak intensity at 2.9 eV, whereas the ratio between these peaks in silica containing 1200 ppm of OH was reversed. The origin of this difference is discussed.
- 社団法人応用物理学会の論文
- 2000-01-15
著者
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KUZUU Nobu
Department of Applied Physics, University of Fukui
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Kawaguchi Y
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Kuzuu Nobu
Department Of Applied Physics Fukui University
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KAWAGUCHI Yoshizo
Chugoku National Industrial Research Institute
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