Hydroxyl-concentration distribution near the binding interface formed by heating contacted flat silica glass surfaces at high temperature
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概要
- 論文の詳細を見る
The hydroxyl-concentration distributions near the binding interface formed by heating contacted flat surfaces of various kinds of silica glasses at 1150℃ were measured. The hydroxyl contents near the binding interface formed by the silica glass plates containing 1150wt. ppm OH decreased, while those of the OH-free silica increased. As for a silica glass with ≈200wt. ppm OH, the change in the hydroxyl content near the binding interface was within the variation of the hydroxyl content, ±≈20wt. ppm.
- 社団法人日本セラミックス協会の論文
- 2009-02-01
著者
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KUZUU Nobu
Department of Applied Physics, University of Fukui
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Kuzuu Nobu
Dep. Of Applied Physics Univ. Of Fukui
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Kuzuu Nobu
Department Of Applied Physics Fukui University
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Tanaka Mitsuya
Center For Computing And Network Services University Of Fukui
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Horikoshi Hideharu
Tosoh Sgm Corporation
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OKAZAKI Akihide
Department of Applied Physics, University of Fukui
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SEKI Tomoya
Department of Applied Physics, University of Fukui
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Seki Tomoya
Department Of Applied Physics University Of Fukui
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Okazaki Akihide
Department Of Applied Physics University Of Fukui
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