Large-Area Deposition of Tin Oxide Film by Photochemical Vapour Deposition (第38回真空に関する連合講演会プロシ-ディングス(1997年11月5日〜7日,東京))

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概要

• 論文の詳細を見る
• 日本真空協会の論文
• 1998-03-20

著者

• Ishida Tadashi

  National Institute Of Advanced Industrial Science And Technology

• TATSUTA Toshiaki

  SAMCO International Inc.

• Ishida Toshimasa

  Research Laboratory Oki Electric Industry Co. Lid

• Ishida Takayuki

  Department Of Radiology National Federation Of Health Insurance Societies Osaka Chuo Hospital

• Ishida T

  Department Of Physics Faculty Of Science Ibaraki University

• Mihara T

  National Institute Of Advanced Industrial Science And Technology

• Makabe R

  Osaka National Research Institute

• MOCHIZUKI Shoichi

  National Institute of Advanced Industrial Science and Technology

• TAMURA Shigeharu

  Osaka National Research Institute

• MAGARA Hiroyuki

  Industrial Technology Center of Fukui Prefecture

• ISHIDA Tadashi

  Osaka National Research Institute

• MOCHIZUKI Shoichi

  Osaka National Research Institute

• MIHARA Toshiyuki

  Osaka National Research Institute

• KOBAYASHI Hironori

  Osaka National Research Institute

• MAKABE Ryoji

  Osaka National Research Institute

• TABATA Osamu

  Thin Film Lab.

• Magara H

  Industrial Technical Center Of Fukui Prefecture Fukui Jpn

• Magara Hiroyuki

  Industrial Technical Center Of Fukui Prefecture

• Mochizuki S

  National Institute Of Advanced Industrial Science And Technology

• Tatsuta Toshiaki

  SAMCO INTERNATIONAL Co., Ltd.

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• Preparation of Ferroelectric Thin Films of Bismuth Layer Structured Compounds
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• Characteristics of Bismuth Layered SrBi_2Ta_2O_9 Thin-Film Capacitors and Comparison with Pb(Zr, Ti)O_3
• Origin of Depolarization in Sol-Gel Ferroelectric Pb(Zr_Ti_)O_3 Thin-Film Capacitors
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