High-Deposition-Rate Growth of Lead Titanate Zirconate Films by Reactive Electron Beam Coevaporation (<Special Issue> FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-09-30

著者

• Ishida Tadashi

  National Institute Of Advanced Industrial Science And Technology

• Ishida Toshimasa

  Research Laboratory Oki Electric Industry Co. Lid

• Ishida Takayuki

  Department Of Radiology National Federation Of Health Insurance Societies Osaka Chuo Hospital

• Ishida T

  Department Of Physics Faculty Of Science Ibaraki University

• Mihara T

  National Institute Of Advanced Industrial Science And Technology

• MOCHIZUKI Shoichi

  National Institute of Advanced Industrial Science and Technology

• ISHIDA Tadashi

  Osaka National Research Institute

• MOCHIZUKI Shoichi

  Osaka National Research Institute

• MIHARA Toshiyuki

  Osaka National Research Institute

• Mochizuki S

  National Institute Of Advanced Industrial Science And Technology

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