Influence of Sputtering and Annealing Conditions on the Structure and Ferroelectric Properties of Pb(Zr,Ti)O_3 Thin FilmS Prepared by RF Magnetron Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-09-30
著者
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Ishida Tadashi
National Institute Of Advanced Industrial Science And Technology
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Ishida Toshimasa
Research Laboratory Oki Electric Industry Co. Lid
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Ishida Takayuki
Department Of Radiology National Federation Of Health Insurance Societies Osaka Chuo Hospital
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Ishida T
Department Of Physics Faculty Of Science Ibaraki University
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Mihara T
National Institute Of Advanced Industrial Science And Technology
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THOMAS Reji
National Institute of Advanced Industrial Science and Technology
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MOCHIZUKI Shoichi
National Institute of Advanced Industrial Science and Technology
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MIHARA Toshiyuki
National Institute of Advanced Industrial Science and Technology
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Mochizuki S
National Institute Of Advanced Industrial Science And Technology
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