Relationship between Crystal Structure and Chemical Composition of PbTiO_3 Thin Films Prepared by Sputter-Assisted Plasma CVD
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概要
- 論文の詳細を見る
PbTiO_3 thin films were prepared by sputter-assisted plasma chemical vapor deposition (CVD) on Pt-coated glass substrates at a substrate temperature of 500℃. As the source materials, a Pb metal target, TiCl_4 gas and O_2 gas were used. The crystal structures of the films changed from a pyrochlore phase to a perovskite one, and to a PbO (red) one with increasing Pb/Ti atomic ratio.
- 社団法人応用物理学会の論文
- 1992-06-15
著者
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KIMURA Saburo
Government Industrial Research Institute
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MAKABE Ryoji
Government Industrial Research Institute
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Makabe R
Osaka National Research Institute
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MOCHIZUKI Shoichi
National Institute of Advanced Industrial Science and Technology
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Mochizuki S
National Institute Of Advanced Industrial Science And Technology
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Mihara Toshiyuki
Government Industrial Research Institute Osaka
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MOCHIZUKI Schoichi
Government Industrial Research Institute, Osaka
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