Determination of the Mass Thickness and True Density of Vacuum-Deposited Cr Films by X-Ray Fluorescence
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1980-11-05
著者
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KIMURA Saburo
Government Industrial Research Institute
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SATO Yoshiyuki
Government Industrial Research Institute
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Kimura Saburo
Government Industrial Research Institute Osaka
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KATSUBE Yoshiyuki
Government Industrial Research Institute Osaka
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Sato Yoshiyuki
Government Industrial Research Institute Osaka
関連論文
- Substrate Dependence of Laser-Induced Damage Threshold of Scandium Oxide High-Reflector Coatings for UV Pulsed Laser
- Influence of Deposition Parameters on Laser Damage Threshold of 355-nm Scandium Oxide-Magnesium Fluoride High-Reflector Coatings
- Mineralogical Analyses of a Precambrian Stromatolite
- Preparation of PbTiO_3 Thin Films by Sputter Assisted Plasma Chemical Vapor Deposition Method : T: THIN FILM
- Relationship between Crystal Structure and Chemical Composition of PbTiO_3 Thin Films Prepared by Sputter-Assisted Plasma CVD
- Determination of the Mass Thickness and True Density of Vacuum-Deposited Cr Films by X-Ray Fluorescence
- Ellipsometric Studies on Plasma-Oxidation Process of Iridium-Carbon Composite Films