Preparation of PbTiO_3 Thin Films by Sputter Assisted Plasma Chemical Vapor Deposition Method : T: THIN FILM

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1989-11-30

著者

• KIMURA Saburo

  Government Industrial Research Institute

• MAKABE Ryoji

  Government Industrial Research Institute

• Mochizuki Shoichi

  Government Industrial Research Institute

関連論文

• Substrate Dependence of Laser-Induced Damage Threshold of Scandium Oxide High-Reflector Coatings for UV Pulsed Laser
• Influence of Deposition Parameters on Laser Damage Threshold of 355-nm Scandium Oxide-Magnesium Fluoride High-Reflector Coatings
• Optical Constants of HgTe and HgSe
• Preparation of PbTiO_3 Thin Films by Sputter Assisted Plasma Chemical Vapor Deposition Method : T: THIN FILM
• Relationship between Crystal Structure and Chemical Composition of PbTiO_3 Thin Films Prepared by Sputter-Assisted Plasma CVD
• Determination of the Mass Thickness and True Density of Vacuum-Deposited Cr Films by X-Ray Fluorescence

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