Ellipsometric Studies on Plasma-Oxidation Process of Iridium-Carbon Composite Films

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概要

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• The plasma oxidation of Ir-C films has been investigated using ellipsometry and XPS (X-ray photoelectron spectroscopy). The XPS measurements show that the concentration of C atoms in the Ir-C film is greatly decreased by plasma oxidation, suggesting that selective sputtering of C atoms from the Ir-C film makes the film porous and facilitates its oxidation. A quantitative analysis of the ellipsometric measurements at a wavelength of 633 nm shows that the refractive index, extinction coefficient and steady-state thickness of the oxide films lie in the ranges 1.5 + 0.1, 0.2 ⊥ 0.1 and 50-110 nm, respectively. A voltammogram of the oxide film indicates that the electrochemical reactions taking place at the film-electrolyte (0.5 M H_2SO_4) interface are highly reversible.

• 社団法人応用物理学会の論文
• 1986-02-20

著者

• SATO Yoshiyuki

  Government Industrial Research Institute

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• Mineralogical Analyses of a Precambrian Stromatolite
• Determination of the Mass Thickness and True Density of Vacuum-Deposited Cr Films by X-Ray Fluorescence
• Ellipsometric Studies on Plasma-Oxidation Process of Iridium-Carbon Composite Films

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