Materials Characterization of Plasma Deposited Copolymer Using CFC-113 With C_2H_4 Monomer
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-07-01
著者
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Minaguchi T
Samco International Inc. Kyoto Jpn
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TSUJI Osamu
SAMCO International Inc.
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MINAGUCHI Takeshi
SAMCO International Inc.
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NAKANO Hirohiko
SAMCO International Inc.
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TATSUTA Toshiaki
SAMCO International Inc.
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Tsuji O
Samco International Co. Ltd.
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Nakano H
R&d Center Samco International Inc.
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Tsuji O
Samco International Inc. Kyoto Jpn
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Tsuji Osamu
Samco International Co. Ltd.
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Tatsuta T
Samco International Co. Ltd.
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Tatsuta Toshiaki
SAMCO INTERNATIONAL Co., Ltd.
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- Fabrication of InP Submicron Pillars for Two-Dimensional Photonic Crystals by Reactive Ion Etching
- Fabrication of Two-Dimensional InP Photonic Band-Gap Crystals by Reactive Ion Etching with Inductively Coupled Plasma
- Materials Characterization of Plasma Deposited Copolymer Using CFC-113 With C_2H_4 Monomer
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