Addition Effect of Argon and Water Vapor on Plasma Copolymerization of Trifluoromethanesulfonic Acid with Octafluorocyclobutane

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Minaguchi T

  Samco International Inc. Kyoto Jpn

• Nakano H

  Samco International Inc. Kyoto Jpn

• Yoshimura K

  Samco International Inc. Kyoto Jpn

関連論文

• Materials Characterization of Plasma Deposited Copolymer Using CFC-113 With C_2H_4 Monomer
• Addition Effect of Argon and Water Vapor on Plasma Copolymerization of Trifluoromethanesulfonic Acid with Octafluorocyclobutane
• Effects of Substrate Refrigeration on Plasma Polymerization with Fluorocarbons

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