スポンサーリンク
Vlsi Research And Development Center Oki Electric Industry Co. Ltd. | 論文
- Influence of Low Dielectric SiOF Film on Metal Oxide Semiconductor Field Effect Transistor Characteristics and Its Impact on Circuit Performance
- Vertical Profile Control in Ultrahigh-Aspect-Ratio Contact Hole Etching with 0.05-µm-Diameter Range
- Reaction Studies between Fluorocarbon Films and Si Using Temperature-Programmed X-Ray Photoelectron and Desorption Spectroscopies
- Studies of Corrosive Outgasses from Via Holes Using Thermal Desorption Spectroscopy
- X-Ray Photoelectron Spectroscopic Studies on Pyrolysis of Plasma-Polymerized Fluorocarbon Films on Si
- Thermal Desorption Spectroscopy and X-Ray Photoelectron Spectroscopy Study of CF_x Layer Deposited on Si and Si0_2
- Thermal Desorption and Infrared Studies of Plasma-Enhanced Chemical Vapor Deposited SiO Films with Tetraethyiorthosilicate
- Characteristics of Very High-Aspect-Ratio Contact Hole Etching
- Dry-Etching Mechanism of Sputtered Pb(Zr_Ti_x)O_3 Film
- 0.2 μm Hole Pattern Generation by Critical Dimension Biassing Using Resin Overcoat
- Fine Contact Hole Etching in Magneto-Microwave Plasma
- Poly(siloxane)-Based Chemically Amplified Resist Convertible into Silicate Glass
- Simulation of Stress Redistribution on LOCOS Structure during Oxidation and Subsequent Cooling Down
- The Effect of Underlayer Texture on Cu Film Orientation in Cu/Refractory-Metal Structure
- A Study of Via-Electromigration Failure in Multilevel Interconnection with High Temperature Sputtered Aluminum
- Corrugated Structures on Si(110) Surfaces Treated in Ammonium Fluoride Solutions