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Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd. | 論文
- Highly Reliable Thin Nitrided SiO_2 Films Formed by Rapid Thermal Processing in an N_2O Ambient
- Thermal Quenching of the Photoluminescence of InGaAs/GaAs Single Quantum Wells Adjacent to a Selectively Oxidized AlAs Layer
- Submicron Ferroelectric Capacitors Fabricated by Chemical Mechanical Polishing Process for High-Density Ferroelectric Memories
- Submicron Ferroelectric Capacitors Fabricated by CMP Process for High-Density FeRAMs
- Method to Obtain Low-Dislocation-Density Regions by Patterning with SiO_2 on GaAs/Si Followed by Annealing
- Reduction of Stress in GaAs with In-Doped GaAs Intermediate Layer Grown on Si Substrate by Metalorganic Chemical Vapor Deposition
- Enhancement of the Breakdown Voltage of GaAs/Al_xGa_As Heterostructures for GaAs Metal-Semiconductor Field Effect Transistors Grown by Metalorganic Chemical Vapor Deposition
- Characterization of Oxygen and Carbon in Undoped AlGaAs Grown by Organometallic Vapor-Phase Epitaxy
- A Novel Gain Measurement Technique for Design of Long-Wavelength Vertical Cavity Lasers
- Copper Interconnects Fabricated by Dry Etching Process
- SiC/SiN Multilayer Membrane for X-Ray Mask Deposited by Low Pressure Chemical Vapor Deposition
- Self-Aligned SiGe HBTs with Doping Level Inversion Using Selective Epitaxy (Special Issue on Ultra-High-Speed IC and LSI Technology)
- Poly(siloxane)-Based Chemically Amplified Resist Convertible into Silicate Glass
- High-Reliability Copper Interconnects through Dry Etchirng Process
- The Photoluminescence Decay of the 2.2 eV-Emission Band in KTaO_3 Single Crystal
- Photoluminescence in KTaO_3 Single Crystal
- Chemically Amplified Bilevel Resist Based on Condensation of Siloxanes : Resist and Processes
- Chemically Amplified Bilevel Resist Based on Condensation of Siloxanes
- Effects of Contact-Hole-Etching Damage on Aluminum Chemical Vapor Deposition
- A Novel Clean Ti Salicide Process Using Grooved Gate Structure