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Fundamental Res. Labs., NEC Corporation | 論文
- Nanostructure Fabrication by Scanning Tunneling Microscope : Microfabrication and Physics
- Nanostructure Fabrication by Scanning Tunneling Microscope
- Superconducting Lines Fabricated from Epitaxial Y-Ba-Cu-O Films : High Temperature Superconducting Thin-Films(Solid State Devices and Materials 1)
- YBa_2Cu_3O_y Superconducting Thin Film Obtained by Laser Annealing : Electrical Properties of Condensed Matter
- Novel Process for Visible Light Emission from Si Prepared by Ion Irradiation
- An Approach for Nanolithography Using Electron Holography
- Fabrication and Characterization of 14-nm-Gate-Length EJ-MOSFETs
- Proposal of Pseudo Source and Drain MOSFETs for Evaluating 10-nm Gate MOSFETs
- Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System : Micro/nanofabrication and Devices
- Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System
- Bi-Level Structures for Focused Ion Beam Using Maskless Ion Etching
- Nanolithography Using a Chemically Amplified Negative Resist by Electron Beam Exposure
- Focused Ion Beam Lithography Using Novolak-Based Resist : Techniques, Instrumentations and Measurement
- Fabrication of Y-Cu Liquid Metal Ion Sources : Techniques, Instrumentations and Measurement
- Etching Characteristics for Organosilica
- Low-Temperature Electron-Beam-Assisted Dry Etching for GaAs Using Electron-Stimulated Desorption
- Electron Beam Irradiation Effects on Cl_2/GaAs
- GaAs Dry Etching Using Electron Beam Induced Surface Reaction : Etching
- New Selective Deposition Technology by Electron Beam Induced Surface Reaction
- Ultrasonic Linear Array Probe with Triple Acoustic Matching Layers : Ultrasonic Transduction