Hashimoto Hideki | Toray Research Center Inc.
スポンサーリンク
概要
関連著者
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Hashimoto Hideki
Toray Research Center Inc.
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SUGITA Yoshihiro
Fujitsu Laboratories Ltd.
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YAMAMOTO Takashi
Toray Research Center, Inc.
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IZUMI Yukiko
Toray Research Center, Inc.
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HASHIMOTO Hideki
Toray Research Center, Inc.
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Yamamoto Takashi
Toray Research Center Inc., Otsu 520-8567, Japan
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Yamamoto Tetsushi
Material And Life Science Graduate School Of Engineering Osaka University
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Hashimoto H
The Dept. Of Electrical & Electronic System Kanazawa University
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Yamamoto T
Toray Research Center Inc.
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Sugiyama Naoyuki
Toray Research Center Inc.
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Sugita Y
Fujitsu Laboratories Ltd.
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Hashimoto H
Toray Research Center Inc.
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Yoshikawa K
Laboratory Of Food Microbiological Engineering Faculty Of Agriculture Kinki University
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Yoshikawa Kentaro
Laboratory Of Food Microbiological Engineering Faculty Of Agriculture Kinki University
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Yoshikawa K
Department Of Bioscience Faculty Of Bioresources Mie University
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Yoshikawa Kazuhiro
Toray Research Center Inc.
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SUGIYAMA Naoyuki
Toray Research Center, Inc.
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Yoshikawa K
Toray Research Center Inc.
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Yoshida Kouji
Department Of Apple Research National Institute Of Fruit Tree Science
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Inoue Koji
Department of Cardiology, St.Mariannna University School of Medicine
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Nagai N
Engineering Research Laboratory Hitachi Maxell Ltd.
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Oyanagi Hiroyuki
Electrotechnical Laboratory
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Nakagawa Yoshitsugu
Toray Research Center Inc.
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Nakagawa Yoshitsugu
Toray Research Center Co. Ltd.
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Uemura Satoshi
Sanki Engineering Co. Ltd.
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MIYAMOTO Takashi
Toray Research Center, Inc.
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SEKI Hirohumi
Toray Research Center, Inc.
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INOUE Minoru
TAIYO NIPPON SANSO CORPORATION
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OOSAWA Masanori
TAIYO NIPPON SANSO CORPORATION
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HASAKA Satoshi
TAIYO NIPPON SANSO CORPORATION
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IKEDA Kazuto
Fujitsu Laboratories Ltd.
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Matsushita Tadashi
Photon Factory National Laboratory For High Energy Physics
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Fujita Keiji
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
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Seki Hirohumi
Toray Research Center Inc.
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Saigo Satoshi
Department Of Physics Faculty Of Science The University Of Tokyo:department Of Physics Jichi Medical
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Toyama Takeshi
The Oarai Center Institute For Materials Research Tohoku University
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MIYAJIMA Hideshi
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Co
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HAYASAKA Nobuo
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Co
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SHIMADA Miyoko
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Co
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Oyanagi Hiroyuki
Electrotech. Lab. Tsukuba
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Yoda Takashi
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
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Nakata Rempei
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
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NAGAI Naoto
Toray Research Center Inc.
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Kaji Naruhiko
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
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Ikeda Kazuto
Fujitsu Laboratories Limited
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Nagai Yasuyoshi
The Oarai Center Institute For Materials Research Tohoku University
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UENO Kazuyoshi
Shibaura Institute of Technology, Dept. of Electronic Engineering
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FUJII Masanori
Sanki Engineering Co., Ltd.
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Uemura S
Sanki Engineering Co. Ltd. Kanagawa Jpn
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Kawasaki Naohiko
Toray Research Center Inc.
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Fujimoto Masatoshi
Department Of Pediatrics St. Marianna University School Of Medicine
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Fujii Masanori
Sanki Engineering Co. Ltd.
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Miyamoto Takashi
Toray Research Center Inc.
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Takamizawa Hisashi
The Oarai Center Institute For Materials Research Tohoku University
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KITAMOTO Katsuyuki
Toray Research Center, Inc.
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KATO Jun
Toray Research Center, Inc.
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MIYAGI Takahiro
Toray Research Center, Inc.
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SHIMIZU Yasuo
The Oarai Center, Institute for Materials Research, Tohoku University
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KAREN Akiya
Toray Research Center, Inc.
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Karen Akiya
Toray Research Center Inc.
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Miyagi Takahiro
Toray Research Center Inc.
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Kitamoto Katsuyuki
Toray Research Center Inc.
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Shimizu Yasuo
The Oarai Center Institute For Materials Research Tohoku University
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Kato Jun
Toray Research Center Inc.
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Nakasaki Yasushi
Corporate, R&D Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Nakasaki Yasushi
Corporate R&D Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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KIHARA Hitoshi
Departtnent of Physics, Jichi Medical School
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KAMINAGA Ukyo
Rigaku Corporation
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YOSHIDA Noboru
Department of Chemistry, Faculty of Science, Hokkaido University
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Hashimoto Hideki
Toray Research Center, Inc., 3-7 Sonoyama 3-chome, Otsu, Shiga 520, Japan
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Hashimoto Hideki
Toray Research Center, Inc., 3-7 Sonoyama 3-chome, Otsu 520-8567, Japan
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Oosawa Masanori
NIPPON SANSO Corp., 10 Okubo, Tsukuba, Ibaraki 300-2611, Japan
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Izumi Yukiko
Toray Research Center, Inc., 3-7 Sonoyama 3-chome, Otsu 520-8567, Japan
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NAGAI Nobuyuki
Toray Research Center, Inc.
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SAIGO Satoshi
Departtnent of Physics, Jichi Medical School
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Sugita Yoshihiro
Fujitsu Laboratories Ltd., 50 Huchigami, Akiruno, Tokyo 197-0833, Japan
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FUJIMOTO Masatoshi
Department of Chemistry, Faculty of Science, Hokkaido University
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Shimada Miyoko
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Kaji Naruhiko
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Akahori Seishi
Toray Research Center, Inc., Otsu 520-8567, Japan
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Razak Liyana
Shibaura Institute of Technology, Koto, Tokyo 135-8548, Japan
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Yamaguchi Takamasa
Shibaura Institute of Technology, Koto, Tokyo 135-8548, Japan
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OYANAGI Hiroyuki
Electrotech. Lab. , Tsukuba
著作論文
- Characterization of HfO_2 Films Prepared on Various Surfaces for Gate Dielectrics(High-κ Gate Dielectrics)
- Characterization of HfO_2 Films Prepared on Various Surfaces for Gate Dielectrics
- Thermal Stability of the Yttrium Aluminate Film and the Suppression of its structural change and electrical properties degradation
- In Situ Observation of Native Oxide Growth on a Si(100) Surface Using Grazing Incidence X-Ray Reflectivity and Fourier Transform Infrared Spectrometer : Semiconductors
- Current Induced Grain Growth of Electroplated Copper Film (Special Issue : Advanced Metallization for ULSI Applications)
- Three-Dimensional Elemental Analysis of Commercial 45nm Node Device with High-k/Metal Gate Stack by Atom Probe Tomography
- Structural Changes of Y2O3 and La2O3 Films by Heat Treatment
- Twenty-Five Millisecond Resolution Time-Resolved X-Ray Absorption Spectroscopy in Dispersive Mode
- Structural Studies of High-Performance Low-$k$ Dielectric Materials Improved by Electron-Beam Curing