Nakata Rempei | Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
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概要
- 同名の論文著者
- Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba の論文著者
関連著者
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Fujita Keiji
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
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MIYAJIMA Hideshi
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Co
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HAYASAKA Nobuo
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Co
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Yoda Takashi
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
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Nakata Rempei
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
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Nakasaki Yasushi
Corporate R&D Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Nishiyama Yukio
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
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MIYASHITA Naoto
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Co
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SHIMADA Miyoko
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Co
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Kaji Naruhiko
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
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Hashimoto Hideki
Toray Research Center Inc.
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Nakasaki Yasushi
Corporate, R&D Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Yoda Takashi
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Nishiyama Yukio
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Nakata Rempei
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Miyajima Hideshi
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Miyashita Naoto
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Hashimoto Hideki
Toray Research Center, Inc., 3-7 Sonoyama 3-chome, Otsu, Shiga 520, Japan
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Shimada Miyoko
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Kaji Naruhiko
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
著作論文
- High-Performance SiOF Film Fabricated Using a Dual-Frequency-Plasma Chemical Vapor Deposition system
- Properties of High-Performance Porous SiOC Low-$k$ Film Fabricated Using Electron-Beam Curing
- Structural Studies of High-Performance Low-$k$ Dielectric Materials Improved by Electron-Beam Curing