Tsutsui Gen | Institute Of Industrial Science University Of Tokyo
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概要
関連著者
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Tsutsui Gen
Institute Of Industrial Science University Of Tokyo
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Hiramoto Toshiro
Institute Of Industrial Science The University Of Tokyo
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HIRAMOTO Toshiro
Institute Industrial Science, The University of Tokyo
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Hiramoto Toshiro
Institute Of Industrial Science University Of Tokyo
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TSUTSUI Gen
Institute of Industrial Science, University of Tokyo
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Saitoh Masumi
Institute Of Industrial Science University Of Tokyo
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Hiramoto T
Univ. Tokyo
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SAITOH Masumi
Institute of Industrial Science, University of Tokyo
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SAITOH Masumi
Toshiba Corporation
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Hiramoto Toshiro
The Authors Are With Institute Of Industrial Science The University Of Tokyo:the Author Is With Vlsi
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Hiramoto Toshiro
Vlsi Design And Education Center The University Of Tokyo:institute Of Industrial Science The Univers
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Hiramoto Toshiro
Inst. Of Industrial Science And Cinqie University Of Tokyo
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Hiramoto Toshiro
Vlsi Design And Education Center The University Of Tokyo
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Putra Arifin
Institute Of Industrial Science University Of Tokyo
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TAMSIR Arifin
Institute of Industrial Science, University of Tokyo
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JANUAR Doni
Institute of Industrial Science, University of Tokyo
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NAGUMO Toshiharu
Institute of Industrial Science, University of Tokyo
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Januar Doni
Institute Of Industrial Science University Of Tokyo
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Tamsir Arifin
Institute Of Industrial Science University Of Tokyo
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Nagumo Toshiharu
Institute Of Industrial Science The University Of Tokyo
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Hiramoto Toshiro
Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan
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Shimizu Ken
Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan
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Tsutsui Gen
Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan
著作論文
- Modeling of Body Factor and Subthreshold Swing in Short Channel Bulk MOSFETs
- Mobility Increase in High-Ns Region in (110)-Oriented UTB pMOSFET Through Surface Roughness Improvement
- Experimental Study on the Universality of Mobility Behavior in Ultra Thin Body Metal Oxide Semiconductor Field Effect Transistors
- Modeling of Body Factor and Subthreshold Swing in Bulk Metal Oxide Semiconductor Field Effect Transistors in Short-Channel Regime
- Experimental Study on Mobility Universality in (100) Ultrathin Body nMOSFETs with SOI Thickness of 5 nm
- Experimental Study on the Universality of Mobility Behavior in Ultra Thin Body Metal Oxide Semiconductor Field Effect Transistors
- Experimental Study on Mobility in (110)-Oriented Ultrathin-Body Silicon-on-Insulator n-Type Metal Oxide Semiconductor Field-Effect Transistor with Single- and Double-Gate Operations