Alkylsilane Self-Assembled Monolayer Photolithography : Effects of Proximity Gap on Photodegradation and Patterning Resolution
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2003-04-01
著者
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Sugimura Hiroyuki
Department of Cardiology and Pneumology, Dokkyo University School of Medicine
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HONG Lan
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University
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TAKAI Osamu
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University
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NAKAGIRI Nobuyuki
Core Technology Center, Nikon Co.
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OKADA Masashi
Nikon Technologies Inc.
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Takai Osamu
Department Of Materials Processing Engineering Graduate School Of Engineering Nagoya University
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Hong Lan
Department Of Materials Processing Engineering Graduate School Of Engineering Nagoya University
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Sugimura Hiroyuki
Department Of Cardiology And Pneumology Dokkyo University School Of Medicine
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Sugimura H
Department Of Materials Processing And Engineering Graduate School Of Engineering Nagoya University
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Sugimura Hiroyuki
Department Of Materials Processing Engineering Graduate School Of Engineering Nagoya University
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Sugimura Hiroyuki
Tsukuba Research Laboratory Nikon Co.:(present Address)depeartrnent Of Materials Processing Enginerr
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Nakagiri Nobuyuki
Core Technology Center Nikon Co.
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Sugimura Hiroyuki
Department Of Cardiology & Vascular Disease Dokkyo Medical University Nikko Medical Center
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Sugimura Hiroyuki
Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University, Sakyo-ku, Kyoto 606-8501, Japan
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Takai Osamu
Department of Materials and Processing Engineering, Nagoya University,
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