Kelvin Probe Force Microscopy Images of Microstructured Organosilane Self-Assembled Monolayers

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概要

• 論文の詳細を見る

• A difference in surface potentials between organosilane self-assembled monolayers (SAMs) was measured by means of Kelvin probe force microscopy (KFM). The SAMs were deposited on a single Si substrate from alkylsilane, that is, octadecyltrimethoxysilane (ODS) [H3C(CH2)17Si(OCH3)3], and fluoroalkylsilane (FAS), that is, heptadecafluoro-1,1,2,2-tetrahydro-decyl-1-trimethoxysilane [F3C(CF2)7(CH2)2Si(OCH3)3]. The locations of these SAMs on the substrate were defined by means of a photolithographic technique. The regions terminated with ODS and FAS were clearly distinguished by KFM with the surface potential difference between the ODS- and FAS-terminated surfaces under optimized imaging conditions. The surface potential of the FAS-terminated region was $170\sim 180$ mV lower than the potential of the ODS-terminated surface. The origin of such a low surface potential of FAS-SAM was ascribed to the larger dipole moment of the FAS molecule induced by the electron negativity of F atoms as estimated from a molecular orbital calculation.

• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 2001-06-30

著者

• Saito Nagahiro

  Department Of Materials Processing And Engineering Graduate School Of Engineering Nagoya University

• Takai Osamu

  Department Of Materials Processing Engineering Graduate School Of Engineering Nagoya University

• Hayashi Kazuyuki

  Department Of Biopharmaceutics Graduate School Of Pharmaceutical Sciences Osaka University

• Nakagiri Nobuyuki

  Core Technology Center Nikon Co.

• Sugimura Hiroyuki

  Department Of Cardiology & Vascular Disease Dokkyo Medical University Nikko Medical Center

• Saito Nagahiro

  Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa, Nagoya 464-8603, Japan

• Hayashi Kazuyuki

  Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa, Nagoya 464-8603, Japan

• Sugimura Hiroyuki

  Department of Materials Science and Engineering, Kyoto University, Kyoto 606-8501, Japan

• Sugimura Hiroyuki

  Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa, Nagoya 464-8603, Japan

• Sugimura Hiroyuki

  Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusaku, Nagoya 464-8603, Japan

• Sugimura Hiroyuki

  Department of Materials Science and Engineering, Kyoto University, Yoshida-Hon'machi, Sakyo, Kyoto 606-8501, Japan

• Nakagiri Nobuyuki

  Core Technology Center, Nikon Co., Shinagawa, Tokyo 140-8601, Japan

• Takai Osamu

  Department of Materials and Processing Engineering, Nagoya University,

• Sugimura Hiroyuki

  Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japan

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