Photochemical Oxidation of Chloromethylphenylsiloxane Self-assembled Monolayer Amplified with Atmospheric Oxygen and Its Application to Micropatterning
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概要
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An excimer lamp irradiating vacuum ultraviolet (VUV) light 172 nm in wavelength has been applied to the photochemical conversion and micropatterning of a $ p$-chloromethylphenylsilyl self-assembled monolayer (CMPhS-SAM) in the presence of atmospheric oxygen. The terminal functional groups of the CMPhS-SAM, the –CH2Cl, were photochemically converted to polar functional groups, mostly –COOH. This chemical conversion was accelerated with atomic oxygen species photochemically generated through VUV excitation of atmospheric oxygen molecules. By irradiating a CMPhS-SAM sample with VUV thorough a photomask, a microchemical pattern consisting of hydrophobic and hydrophilic regions was formed on the SAM surface. Furthermore, by selectively depositing $n$-octadecyltrimethoxysilane (ODS) molecules on the hydrophilic region, a binary microstructure consisting of CMPhS and ODS was successfully fabricated with an optimum spatial resolution of 1 μm.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-15
著者
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Hong Lan
Department Of Materials Processing Engineering Graduate School Of Engineering Nagoya University
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Lee Kyung-hwang
Department Of Materials Science And Engineering Graduate School Of Engineering Kyoto University
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Sugimura H
Department Of Materials Processing And Engineering Graduate School Of Engineering Nagoya University
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Sugimura Hiroyuki
Tsukuba Research Laboratory Nikon Co.:(present Address)depeartrnent Of Materials Processing Enginerr
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Sugimura Hiroyuki
Department Of Cardiology & Vascular Disease Dokkyo Medical University Nikko Medical Center
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Lee Kyung-Hwang
Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University, Kyoto 606-8501, Japan
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Sugimura Hiroyuki
Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University, Sakyo-ku, Kyoto 606-8501, Japan
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