Resin Elongation Phenomenon of Polystyrene Nanopillars in Nanoimprint Lithography
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概要
- 論文の詳細を見る
We investigated the elongation of polystyrene nanopillars formed by thermal nanoimprint lithography. Silicone and perfluoropolyether were used as mold release agents to obtain molds with different adhesion forces against polystyrene to be imprinted. The adhesion force between the resin and release layers was evaluated as a force curve by atomic force microscope with a polystyrene colloid probe. Elongation depended on the aspect ratio of the corresponding microholes on the mold and the adhesion force against the release layer. The conditions under which the elongation occurred exhibited a clear threshold on the stress loaded on the foot area of the nanopillars.
- 2010-10-25
著者
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Miyauchi Akihiro
Materials Research Laboratory Hitachi Ltd.
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Kuwabara Kosuke
Materials Research Laboratory Hitachi Ltd.
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Sugimura Hiroyuki
Department Of Cardiology & Vascular Disease Dokkyo Medical University Nikko Medical Center
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Sugimura Hiroyuki
Department of Materials Science and Engineering, Kyoto University, Kyoto 606-8501, Japan
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Sugimura Hiroyuki
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusaku, Nagoya 464-8603, Japan
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Sugimura Hiroyuki
Department of Materials Science and Engineering, Kyoto University, Yoshida-Hon'machi, Sakyo, Kyoto 606-8501, Japan
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Kuwabara Kosuke
Materials Research Laboratory, Hitachi, Ltd., 7-1-1 Omika, Hitachi, Ibaraki 319-1292, Japan
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Miyauchi Akihiro
Materials Research Laboratory, Hitachi, Ltd., 7-1-1 Omika, Hitachi, Ibaraki 319-1292, Japan
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Sugimura Hiroyuki
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japan
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