Chemical Approach to Nanofabrication: Modifications of Silicon Surfaces Patterned by Scanning Probe Anodization
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概要
- 論文の詳細を見る
Scanning probe microscope-induced local oxidation of a material surface with adsorbed water is a recent nanolithographic technology. We applied this technique to the nanoscale patterning of hydrogen-terminated silicon (Si-H) surfaces. Using the silicon oxide (SiO_x) patterns as masking, examples of two types of pattern transfer method through area-selective chemical modification were demonstrated. Nanostructures of substrate Si or deposited gold were fabricated by wet chemical etching or electroless plating, respectively. These area selectivities arose from the difference in surface chemical reactivities between anodic SiO_x and the surrounding Si-H. The oxidation chemistry is discussed in terms of anodization.
- 社団法人応用物理学会の論文
- 1995-06-30
著者
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SUGIMURA Hiroyuki
Tsukuba Research Lab., Nikon Co.
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NAKAGIRI Nobuyuki
Tsukuba Research Lab., Nikon Co.
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Sugimura Hiroyuki
Tsukuba Research Laboratory Nikon Co.
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Sugimura Hiroyuki
Department of Materials Science and Engineering, Kyoto University, Kyoto 606-8501, Japan
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Sugimura Hiroyuki
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusaku, Nagoya 464-8603, Japan
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Sugimura Hiroyuki
Department of Materials Science and Engineering, Kyoto University, Yoshida-Hon'machi, Sakyo, Kyoto 606-8501, Japan
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Sugimura Hiroyuki
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japan
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