Alkylsilane Self-Assembled Monolayer Photolithography: Effects of Proximity Gap on Photodegradation and Patterning Resolution
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概要
- 論文の詳細を見る
Photopatterning of an alkylsilane self-assembled monolayer (SAM) has been conducted through photodegradation of the monolayer due to irradiation with a vacuum-ultraviolet light of 172 nm wavelength. Effects of the proximity gap on the photodegradation reaction of the monolayer were investigated based on water contact angle measurements and field-emission scanning electron microscopy (FE-SEM). A larger proximity gap between a sample substrate and a photomask was more favorable for promoting the photochemical reactions but degraded the patterning resolution. The irradiation time in order to complete patterning of the monolayer decreased with increasing the proximity gap. Under the optimized irradiation time and proximity gap, micropatterns of lines (1–20 μm), circles ($\phi$ 20 μm) and squares ($20\,{\micron}\times 20\,{\micron}$) were successfully transferred to the SAM-covered silicon substrates.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-04-01
著者
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OKADA Masashi
Nikon Technologies Inc.
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Hong Lan
Department Of Materials Processing Engineering Graduate School Of Engineering Nagoya University
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Nakagiri Nobuyuki
Core Technology Center Nikon Co.
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Sugimura Hiroyuki
Department Of Cardiology & Vascular Disease Dokkyo Medical University Nikko Medical Center
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Sugimura Hiroyuki
Department of Materials Science and Engineering, Kyoto University, Kyoto 606-8501, Japan
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Sugimura Hiroyuki
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusaku, Nagoya 464-8603, Japan
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Sugimura Hiroyuki
Department of Materials Science and Engineering, Kyoto University, Yoshida-Hon'machi, Sakyo, Kyoto 606-8501, Japan
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Takai Osamu
Department of Materials and Processing Engineering, Nagoya University,
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Takai Osamu
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japan
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Sugimura Hiroyuki
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japan
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