Self-Assembled Alkanethiol Monolayer on Patterned Gold Fabricated by Scanning Probe Anodization-Based Nanolithography
スポンサーリンク
概要
- 論文の詳細を見る
Nanolithography based on scanning probe anodization was applied to fabricate Au structures on a silicon (Si) surface. A hydrogen-terminated Si (Si-H) substrate was first patterned by scanning probe anodization, and then treated in a gold (Au) electroless plating bath. The Au plating proceeded selectively on the Si-H surface where it was not anodized, while the anodized surface areas remained free from plating. Consequently, Au lines narrower than 100 nm were fabricated between the anodic oxide lines. A self-assembled monolayer (SAM) of n-hexadecyl mercaptan was formed onto the surface of these Au nanostructures. It was confirmed by Auger electron spectroscopy that the SAM formation was localized on the Au surface.
- 社団法人応用物理学会の論文
- 1995-06-01
著者
-
SUGIMURA Hiroyuki
Tsukuba Research Lab., Nikon Co.
-
NAKAGIRI Nobuyuki
Tsukuba Research Lab., Nikon Co.
-
Sugimura Hiroyuki
Tsukuba Research Laboratory Nikon Co.
-
Nakagiri Nobuyuki
Tsukuba Research Laboratory Nikon Co.
-
Sugimura Hiroyuki
Department of Materials Science and Engineering, Kyoto University, Kyoto 606-8501, Japan
-
Sugimura Hiroyuki
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusaku, Nagoya 464-8603, Japan
-
Sugimura Hiroyuki
Department of Materials Science and Engineering, Kyoto University, Yoshida-Hon'machi, Sakyo, Kyoto 606-8501, Japan
-
Sugimura Hiroyuki
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japan
関連論文
- 2P-330 青色蛍光シリコンナノクリスタルによる生物医学的な実験および診断(バイオイメージング(1),第46回日本生物物理学会年会)
- Patterning of Self-assembled Thin Films Using Vacuum Ultraviolet Irradiation Through Anodic Porous Alumina Mask
- Organic Monolayers Covalently Bonded to Si as Ultra Thin Photoresist Films in Vacuum UV Lithography
- Scanning Capacitance Microscopy as a Characterization Tool for Semiconductor Devices
- Scanning Capacitance Microscopy as a Characterization Tool for Semiconductor Devices
- SiO_2/Si System Studied by Scanning Capacitance Microscopy
- Resin Elongation Phenomenon of Polystyrene Nanopillars in Nanoimprint Lithography
- Quantitative Analysis of Titanium Ions in the Equilibrium with Metallic Titanium in NaCl-KCl Equimolar Molten Salt
- Chemical Approach to Nanofabrication: Modifications of Silicon Surfaces Patterned by Scanning Probe Anodization
- Data Processing in the Extraction of Properties from Force Curves for Mapping
- Scanning Probe Lithography Using a Trimethylsilyl Organosilane Monolayer Resist
- Combination of Photo and Atomic Force Microscope Lithographies by Use of arm Organosilane Monolayer Resist
- Self-Assembled Alkanethiol Monolayer on Patterned Gold Fabricated by Scanning Probe Anodization-Based Nanolithography
- Circular Arrays of Gold Nanoparticles of a Single Particle Line Thickness Formed on Indium Tin Oxide
- Surface Chemical Conversion of Organosilane Self-Assembled Monolayers with Active Oxygen Species Generated by Vacuum Ultraviolet Irradiation of Atmospheric Oxygen Molecules
- Frequency Modulation Atomic Force Microscopy in Ionic Liquid Using Quartz Tuning Fork Sensors
- Kelvin Probe Force Microscopy Images of Microstructured Organosilane Self-Assembled Monolayers
- Self-Assembled Monolayers Directly Attached to Silicon Substrates Formed from 1-Hexadecene by Thermal, Ultraviolet, and Visible Light Activation Methods
- Frictional Properties of Organosilane Self-Assembled Monolayer in Vacuum
- Spatially Controlled Functionalization and Chemical Manipulation to Fabricate Two-Dimensional Arrays of Gold Nanoparticles onto Indium Tin Oxide
- Micropatterned 1-Alkene Self-Assembled Monolayer on Hydrogen-Terminated Silicon by Vacuum Ultraviolet Lithography
- Alkanethiol Self-Assembled Monolayers Formed on Silicon Substrates
- Analysis of Atomic Force Curve Data for Mapping of Surface Properties in Water
- Scanning Capacitance Microscopy for Alkylsilane-Monolayer-Covered Si Substrate Patterned by Scanning Probe Lithography
- Alkylsilane Self-Assembled Monolayer Photolithography: Effects of Proximity Gap on Photodegradation and Patterning Resolution
- Reversible Potential Change of Ferrocenylthiol Monolayers Induced by Atomic Force Microscopy