Fabrication of Coplanar Microstructures Composed of Multiple Organosilane Self-Assembled Monolayers (Special Issue on Organic Molecular Electronics for the 21st Century)
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概要
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Micropatterning of organosilane self-assembled monolayers (SAMs) was demonstrated on the basis of photolithography using an excimer lamp radiating vacuum ultra-violet (VUV) light of 172 nm in wavelength. This lithography is generally applicable to micropatterning of organic thin films including alkyl and fluoroalkyl SAMs, since its patterning mechanism involves cleavage of C-C bonds in organic molecules and subsequent decomposition of the molecules. In this study, SAMs were prepared on Si substrates covered with native oxide by chemical vapor deposition in which an alkylsilane, that is, octadecyltrimethoxysilane [CH_3(CH_2)_<17>Si(OCH_3)_3, ODS] or a fluoroalkylsilane, that is, 1H, 1H, 2H, 2H-perfluorodecyltrimethoxy-silane [CF_3(CF_2)_7CH_2CH_2Si(OCH_3)_3, FAS] were used as precursors. Each of these SAMs was photoirradiated through a photomask placed on its surface. As confirmed by atomic force microscopy and x-ray photoelectron spectroscopy, the SAMs were decomposed and removed in the photoirradiated area while the masked areas remained undercomposed. A micropattern of 2 μm in width was successfully fabricated. Furthermore, microstructures composed of two different SAMs, that is, ODS and FAS, were fabricated as follows. For example, an ODS-SAM was first micropatterned by the VUV-lithography. Since, the VUV-exposed region on the ODS-SAM showed an affinity to the chemisorption of organosilane molecules, the second SAM, i.e., FAS, confined to the photolithographyically defined pattern was successfully fabricated. Due to the electron negativity of F atoms, the FAS covered region showed a more negative surface potential than that of the ODS surface: its potential difference was ca. 120 mV as observed by Kelvin probe force microscopy.
- 社団法人電子情報通信学会の論文
- 2000-07-25
著者
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Takai Osamu
Center For Integrated Research In Science And Engineering Nagoya University
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Takai Osamu
The Department Of Materials Processing Engineering Graduate School Of Engineering Nagoya University
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SUGIMURA Hiroyuki
the Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya Universit
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HOZUMI Atsushi
the National Industrial Research Institute of Nagoya
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Sugimura H
Department Of Materials Processing And Engineering Graduate School Of Engineering Nagoya University
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Sugimura Hiroyuki
Tsukuba Research Laboratory Nikon Co.:(present Address)depeartrnent Of Materials Processing Enginerr
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Sugimura Hiroyuki
Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University, Sakyo-ku, Kyoto 606-8501, Japan
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