Impact of the Hydrogenation Process on the Performance of Self-Aligned Metal Double-Gate Low-Temperature Polycrystalline-Silicon Thin-Film Transistors (Special Issue : Active-Matrix Flatpanel Displays and Devices : TFT Technologies and FPD Materials)
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概要
- 論文の詳細を見る
- 2013-03-00
著者
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KITAHARA Kuninori
Interdisciplinary Faculty of Science and Engineering, Shimane University
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Hara Akito
Electrical Engineering Faculty Of Engineering Tohoku Gakuin University
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Ogata Hiroyuki
Electronic Engineering, Tohoku Gakuin University, Tagajo, Miyagi 985-8537, Japan
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Shika Yusuke
Electronic Engineering, Tohoku Gakuin University, Tagajo, Miyagi 985-8537, Japan
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Bessho Takuro
Interdisciplinary Graduate School of Science and Engineering, Shimane University, Matsue 690-8504, Japan
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Okabe Yasunori
Electronic Engineering, Tohoku Gakuin University, Tagajo, Miyagi 985-8537, Japan
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Kamo Shinya
Electronic Engineering, Tohoku Gakuin University, Tagajo, Miyagi 985-8537, Japan
関連論文
- Analysis of Defects in Polycrystalline Silicon Thin Films Using Raman Scattering Spectroscopy
- Self-Aligned Metal Double-Gate Low-Temperature Polycrystalline Silicon Thin-Film Transistors on Glass Substrate Using Back-Surface Exposure
- Fabrication of Large Lateral Polycrystalline Silicon Film by Laser Dehydrogenation and Lateral Crystallization of Hydrogenated Nanocrystalline Silicon Films
- Diffusion Coefficient of Hydrogen in Silicon at an Intermediate Temperature
- Electrochemical and Raman-Scattering Characterizations of Defects in Polycrystalline Silicon Thin Films Formed by Excimer-Laser Annealing, Solid-Phase Crystallization, and Continuous-Wave Laser Lateral Crystallization
- Growth of Quasi-Single-Crystal Silicon--Germanium Thin Films on Glass Substrates by Continuous Wave Laser Lateral Crystallization
- Hydrogenation Effects on Chemical Activity of Defects in Excimer-Laser-Annealed Polycrystalline Silicon Thin Films
- Suppression of Defects during Metal-Induced Lateral Crystallization of Polycrystalline-Silicon Thin Films by Directed Lateral Growth
- Observation of Dislocation Motion in Si1-xGex Thin Film on Si Substrate by Laser Scattering Method
- Analysis of Defects in Polycrystalline Silicon Thin Films Using Raman Scattering Spectroscopy
- Impact of the Hydrogenation Process on the Performance of Self-Aligned Metal Double-Gate Low-Temperature Polycrystalline-Silicon Thin-Film Transistors
- Impact of the Hydrogenation Process on the Performance of Self-Aligned Metal Double-Gate Low-Temperature Polycrystalline-Silicon Thin-Film Transistors (Special Issue : Active-Matrix Flatpanel Displays and Devices : TFT Technologies and FPD Materials)
- Characterization of Defects in Polycrystalline Silicon Thin Films Using Chemical Etching, Hydrogenation, and Raman Spectroscopy
- Effect of Ion Implantation on Dislocation Motion in SiGe/Si Heterostructures
- Structural Elements of Shallow Thermal Donors Formed in Nitrogen-Gas-Doped Silicon Crystals
- Effect of Ion Implantation on Dislocation Motion in SiGe/Si Heterostructure