Use of sub-nanometer thick AlN to arrest diffusion of ion-implanted Mg into regrown AlGaN/GaN layers
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Mishra Umesh
Department of Electrical and Computer Engineering and Materials Department, University of California, Santa Barbara, CA 93106, U.S.A.
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LU Jing
Department of Electrical and Computer Engineering, University of California
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Chowdhury Srabanti
Department of Electrical and Computer Engineering, University of California, Santa Barbara, CA 93106, U.S.A
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Swenson Brian
Department of Electrical and Computer Engineering, University of California, Santa Barbara, CA 93106, U.S.A
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