Mitigation of Low Outgassing and Small Line Edge Roughness for EUVL Resist
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概要
著者
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Komano H
Tokyo Ohka Kogyo Co. Ltd. Kanagawa Jpn
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Watanabe T
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Watanabe Takeo
Univ. Hyogo Hyogo Jpn
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Kinoshita H
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Watanabe Takayuki
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
関連論文
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- Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU
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- Outgassing Analysis in EUV Resist
- Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System
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- Mitigation of Low Outgassing and Small Line Edge Roughness for EUVL Resist
- Resist Outgassing by EUV Irradiation
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