Enhanced Electron Field Emission Characteristics of Carbon Nanoflakes Prepared by Modified RF Sputtering
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概要
- 論文の詳細を見る
Carbon films with flakelike geometry, exhibiting excellent electron field emission (EFE) properties were synthesized by a modified RF sputtering process, which used an Ar:CH4:H2 gas mixture, instead of a conventional Ar:H2 mixture. These films contain nanosized diamonds and allotropic phases (i-carbons and graphites) embedded in amorphous carbon films. The EFE process can be turned on at $E_{0} = 4.83$ V/μm, achieving an EFE current density of $J_{\text{e}} = 280$ μA/cm2 at an 8 V/μm applied field. The EFE properties of these flakelike carbon films essentially do not change with processing parameters, indicating that these carbon films are more process-reliable and hence have better potential for application as electron field emitters.
- 2009-08-25
著者
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Lin I-nan
Department Of Chemistry Materials Science Center National Tsing-hua University
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Shih Wen-ching
Graduate Institute In Electro-optical Engineering Tatung Univ.
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Jeng Jian-Min
Graduate Institute in Electro-Optical Engineering, Tatung University, No. 40, Sec. 3, Chungshan North Road, Taipei 104, Taiwan, R.O.C.
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Chen Huang-Chin
Department of Physics, TamKang University, Taipei 251, Taiwan, R.O.C.
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Lo Jyi-Tsong
FED R&D Division, Tatung Company, No. 22, Sec. 3, Chungshan North Road, Taipei 104, Taiwan, R.O.C.
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