Growth of $c$-Axis-Oriented LiNbO3 Films on ZnO/SiO2/Si Substrate by Pulsed Laser Deposition for Surface Acoustic Wave Applications
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概要
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Highly $c$-axis-oriented LiNbO3(006) thin films were successfully grown on SiO2/Si substrates with a ZnO buffer layer by XeCl excimer pulsed laser deposition (PLD). The as-deposited films were characterized by X-ray diffraction, scanning electron microscopy, and atomic force microscopy to analyze their crystalline structure and surface morphology. The results show that the highly $c$-axis-oriented LiNbO3 thin films of 2.5 μm thickness were successfully grown on SiO2/Si substrates with a ZnO buffer layer by PLD. The full width at half maximum intensity of the LiNbO3(006) peak of the sample fabricated under the optimum deposition conditions is only 0.18°. The center frequency of the LiNbO3/ZnO/SiO2/Si substrate with line width of 4 μm is 188 MHz, and the phase velocity is 3010 m/s, which is slightly lower than that of the 36° $Y$–$X$ LiNbO3 substrate.
- 2008-05-25
著者
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Shih Wen-ching
Graduate Institute In Electro-optical Engineering Tatung Univ.
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Wang Tzyy-long
Graduate Institute In Electro-optical Engineering Tatung University
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Sun Xiao-yun
Graduate Program In Electro-optical Engineering Tatung University
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Wu Mu-shiang
Graduate Institute In Electro-optical Engineering Tatung University
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Sun Xiao-Yun
Graduate Institute in Electro-Optical Engineering, Tatung University, No. 40, Sec. 3, Chungshan North Road, Taipei 104, Taiwan, R.O.C.
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