Silicon Nitride Nanopillars and Nanocones Formed by Nickel Nanoclusters and Inductively Coupled Plasma Etching for Solar Cell Application
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概要
- 論文の詳細を見る
The external quantum efficiency of solar cells can be improved by using textured surface with minimum reflection. We have fabricated nanopillars and nanocone structures on silicon nitride surface by means of self-assembled nickel nano particle masks with single step inductively coupled plasma (ICP) ion etching and double step ICP etching, respectively. Thus, sub-wavelength nanopillar and nanocone-like structures displaying low reflectance were obtained readily without the need for any lithography equipment. The formation mechanism of nanopillar and nanocone like structures fabricated on silicon nitride surface has been discussed. The relationship of etching time with structure height and average reflectance spectra has been drawn.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2009-12-25
著者
-
Li Yiming
Department Of Communication Engineering National Chiao Tung University
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Chang Edward-yi
Department Of Materials Science And Engineering And Microelectronics And Information System Research
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Tinh Tran
Department of Materials Science and Engineering, National Chiao-Tung University, Hsinchu 300, Taiwan
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Sahoo Kartika
Department of Materials Science and Engineering, National Chiao-Tung University, Hsinchu 300, Taiwan
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Lin Men-Ku
Department of Materials Science and Engineering, National Hsing-Hua University, Hsinchu 300, Taiwan
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Huang Jin-Hua
Department of Materials Science and Engineering, National Hsing-Hua University, Hsinchu 300, Taiwan
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