Evaluation of Thin-Film Photodiodes and Development of Thin-Film Phototransistor
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概要
- 論文の詳細を見る
First, a p/i/n thin-film photodiode (TFPD) is evaluated, and it is found that the photoinduced current ($I_{\text{photo}}$) is relatively large. Next, a p/n TFPD is evaluated, and it is found that the $I_{\text{photo}}$ is independent of the applied voltage ($V_{\text{apply}}$). However, it is difficult to simultaneously achieve a large and independent $I_{\text{photo}}$. Therefore, a p/i/n thin-film phototransistor (TFPT) is developed, and it is found that the $I_{\text{photo}}$ can be both relatively large and independent of the $V_{\text{apply}}$ by optimizing the gate voltage. These characteristics are obtained because the depletion layer is formed in the entire intrinsic region and the electric field is always high. It is expected that these characteristics are preferable for some types of photosensor application such as artificial retina.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-03-25
著者
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KIMURA Mutsumi
Department of Electronics and Informatics, Ryukoku University
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INOUE Satoshi
Frontier Device Research Center, Seiko Epson Corporation
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Hara Hiroyuki
Frontier Device Research Center Seiko Epson Corporation
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Shima Takehiro
Department of Electronics and Informatics, Ryukoku University, Seta, Otsu 520-2194, Japan
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Yamashita Takehiko
Department of Electronics and Informatics, Ryukoku University, Seta, Otsu 520-2194, Japan
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Nishizaki Yoshitaka
Department of Electronics and Informatics, Ryukoku University, Seta, Otsu 520-2194, Japan
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Kimura Mutsumi
Department of Chemistry, Graduate School of Natural Science and Technology, Okayama University
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