Temporal Variations in Densities of Y, Ba, and Cu Atoms in Magnetron Sputtering Plasmas with YBaCuO Target
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概要
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In this study, we used optical emission spectroscopy (OES) for examining the temporal variations in the densities of Y, Ba, and Cu atoms sputtered from a YBaCuO target in a magnetron plasma source. It was found that the densities of Y and Cu changed with the discharge period. In a low-pressure, low-power discharge, the temporal variations in the Y and Cu densities were small, whereas they became significant at a high pressure and a high power. Ten minutes after the initiation of the discharge, Y density decreased to 8% of the initial value at an rf power of 70 W and a gas pressure of 300 mTorr. On the other hand, the optical emission intensities from Ar and Ba were roughly constant during the same discharge period. The roughly constant Ar intensity indicates that electron density and electron temperature were almost constant. The discovery of temporal variations in the Y and Cu densities is important for optimizing the discharge parameters for the deposition of high-quality, high-critical-temperature (high-$T_{\text{c}}$) superconductor films.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-10-30
著者
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Sasaki Koichi
Department Of Electrical Engineering And Computer Science Nagoya University
-
Gao Junsi
Department Of Electrical Engineering And Computer Science Nagoya University
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Gao Junsi
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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SASAKI Koichi
Department of Architecture, Faculty of Engineering, Tohoku University
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