Large-Area X-ray Lithography System for LIGA Process Operating in Wide Energy Range of Synchrotron Radiation
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概要
- 論文の詳細を見る
We developed a new X-ray lithography system for the lithographite, galvanoformung and abformung process (LIGA process) using synchrotron radiation at the NewSUBARU facility of the University of Hyogo. The X-ray lithography system can utilize two different energy regions: one is a high-energy region: from 2 keV to 12 keV, and the other is a low-energy region from 1 to 2 keV. Each energy region can be selected in accordance with the size and shape of the desired microstructures. Large-area patterning across an A4-size area was successfully performed with a highly uniform pattern thickness. Furthermore, high-aspect-ratio patterning using a high-X-ray-energy region was also achieved using this X-ray lithography system.
- 2005-07-15
著者
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HARA Hirotsugu
TOYAMA Corporation
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Hattori Tadashi
Laboratory Of Advanced Science And Technology For Industry
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Utsumi Yuichi
Laboratory Of Advanced Science And Technology For Industry
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Kishimoto Takefumi
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Utsumi Yuichi
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Ako-gun, Hyogo 678-1205, Japan
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HATTORI Tadashi
Laboratory of Advanced Science & Technology for Industry, University of Hyogo
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