Mechanism of Nonalloyed Al Ohmic Contacts to n-Type ZnO:Al Epitaxial Layer
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概要
- 論文の詳細を見る
The mechanism of Al ohmic contacts to n-type zinc oxide (ZnO:Al) epitaxial layer was investigated. The formation of an Al-ZnO interfacial phase at room temperature was responsible for the low specific resistivity ($8\pm 0.3\times 10^{-4}$ $\Omega$cm2). The results of Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS) depth profiles, and glancing angle X-ray diffraction (GXRD) indicate that an interfacial reaction between Al and ZnO results in an increased doping concentration in the region of the ZnO surface resulting in a low specific contact resistivity without the need for a thermal annealing process.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-03-15
著者
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KIM Koung-Kook
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology (K-JIST
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PARK Seoug-Ju
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology (K-JIST
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YOON Young
Nano-Materials Research Center & Micro Cell Lab, Korea Institute of Science and Technology (KIST)
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ADESIDA Ilesanmi
Department of Electrical and Computer Engineering and Micro and Nanotechnology Laboratory, Universit
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Seong Tae-yeon
Department Of Materials Science And Engineering And Centre For Electronic Materials Research Kwangju
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Kim Han-Ki
Department of Advanced Materials Engineering for Information and Electronics, Kyung Hee University, Yongin, Gyeonggi 446-701, Republic of Korea
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Park Seoug-Ju
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology (K-JIST), Kwangju 500-712, Korea
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Yoon Young
Nano-Materials Research Center& Micro Cell Lab, Korea Institute of Science and Technology (KIST), P.O. Box, 131 Cheongryang, Seoul 130-650, Korea
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Kim Koung-Kook
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology (K-JIST), Kwangju 500-712, Korea
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Adesida Ilesanmi
Department of Electrical and Computer Engineering and Micro and Nanotechnology Laboratory, University of Illinois, Urbana, Illinois 61801, U.S.A.
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