Near-Field Distribution of Radial Line Slot Antenna for Surface-Wave-Coupled Plasma Generation
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概要
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In plasma processing systems for large-size wafers, quick evacuation of reaction gas by making the process space narrow is urgently required to realize higher productivity and better quality for microelectronic devices. Wafers must be placed close to the antenna aperture in this case. A radial line slot antenna (RLSA) for surface-wave-coupled plasma (SWP) is a promising candidate to this end. A novel slot arrangement in the aperture, consisting of densely arrayed transverse slots, was fabricated and tested. A uniform, high-density ($3\times 10^{11}$ cm-3) and large-area plasma at low electron temperature has already been realized in previous experiments. It dispenses with the DC magnetic fields required in ECR systems. For further development of the slot design, as well as the mechanism determination of plasma generation, in this paper we evaluate the electromagnetic near fields of SWP-RLSAs. As the first step, antennas in free space without the plasma as well as a glass vacuum window, are analyzed using a periodic array model. The predicted near-field distribution is compared with those of previous experiments and a reasonable agreement is reported.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-01-15
著者
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石井 信雄
東京エレクトロン
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GOTO Naohisa
Department of Electronics and Systems, Faculty of Engineering, Takushoku University
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Ono Mitsuhiro
Department Of Electrical And Electronic Engineering Faculty Of Engineering Yamagata University
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Yasaka Yasuyoshi
Department Of Electonics Kyoto University
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Ando Makoto
Department Of Applied Physics Faculty Of Engineering Tokyo University Of Agriculture And Technology
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Yamamoto Tetsuya
Department Of Astronomy School Of Science The University Of Tokyo
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Ishii Nobuo
Corporate R & D Central Research Laboratory Tokyo Electron Lmited
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Goto Naohisa
Department of Electronics and Systems, Faculty of Engineering, Takushoku University, 815-1 Tatemachi, Hachioji, Tokyo 193-8511, Japan
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Ishii Nobuo
Corporate R&D Central Research Laboratory, Tokyo Electron Ltd. 650 Mitsuzawa, Hosaka-cho, Nirasaki, Yamanashi 407-0192, Japan
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Ishii Nobuo
Corporate R&D Central Research Laboratory, Tokyo Electron Limited, Hosaka-cho, Nirasaki 407-01, Japan
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Yamamoto Tetsuya
Department of Electrical and Electronic Engineering, Faculty of Engineering, Yamagata University, 4-3-16 Johnan, Yonezawa, Yamagata 992-8510, Japan
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Yasaka Yasuyoshi
Department of Electronic Science and Engineering, Faculty of Engineering, Kyoto University, Yoshida-honcho, Sakyo-ku, Kyoto 606-8501, Japan
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Ando Makoto
Department of Electrical and Electronic Engineering, Faculty of Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan
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