Simulation of Plasma Production and Chemical Reaction in an Oxide Deposition Apparatus Using Electron Cyclotron Resonance Plasma

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-07-01

著者

• Amano Hideaki

  Sagami Plant Tokyo Electron Tohoku Limited

• Ishii N

  Central Research Laboratory Tokyo Electron Ltd.

• Ishii Nobuo

  Corporate R&d Central Research Laboratory Tokyo Electron Ltd.

• Morimoto Tamotsu

  Corporate R & D Central Research Laboratory Tokyo Electron Lmited

• Yasaka Yasuyoshi

  Department of Electronic Science and Engineering, Kyoto University

• TOZAWA Masaki

  Sagami Plant, Tokyo Electron Tohoku Limited

• AKAHORI Takashi

  Sagami Plant, Tokyo Electron Tohoku Limited

• Tozawa Masaki

  Sagami Plant Tokyo Electron Tohoku Limited

• Yasaka Y

  Department Of Electronic Science And Engineering Kyoto University

• Yasaka Yasuyoshi

  Department Of Electonics Kyoto University

• Akahori Takashi

  Sagami Plant Tokyo Electron Tohoku Limited

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