MeVイオン注入による固体表面の隆起

概要

論文の詳細を見る
Surface swelling of sintered silicon-nitride, sintered alumina and single crystal sapphire implanted with 0.7-3 MeV N+. Si+ and Ni+ ions to 5×1013-5×1017 ions/cm2, were evaluated by measuring the step height of the implanted region with a surface profile meter. The swelling became measurable when the dose exceeded 1×1014-1×1015 ions/cm2, increased with increasing dose, then saturated. In the case of implantation of heavier ions or for low temperature implantation, the dose required to induce a measurable swelling is lower and the step height for saturation is higher. The step height profile versus dose for silicon-nitride is not similar to the one for alumina or sapphire. The swelling of the single crystal is larger than that of the sintered material, generally. After the annealing (1200°C, 1 hr in vacuum), the swelling is reduced about 30%. This phenomenon of surface swelling can be simulated semi-qualitatively by Monte Carlo calculation.
社団法人粉体粉末冶金協会の論文