PLD法により作製したLaPbMnO系薄膜のキュリー温度

概要

論文の詳細を見る
Fabrication of epitaxial La_<1-x>Pb_xMnO_<3-y> (LPMO) films with Curie temperatures (T_c) above room temperature (RT) was attempted, using the pulsed laser ablation deposition (PLD) method, as part of a fundamental study for developing multilayered devices that work at RT. X-ray diffraction indicated growth of epitaxial films with a good crystallinity. Films with T_c about 350 K can be prepared under deposition conditions in which the substrate temperature (T_s) is 600℃ and the oxygen pressure (P_o) is not less than 0.4 Torr. It was found that the T_c decreased with increasing T_s or decreasing P_o. The decrease in T_c with increasing T_s was shown by electron probe microanalysis to be due to evaporation of lead (Pb) from the film. On the other hand, the decrease in T_c with decreasing P_o was found to be due to decrease of the film's oxygen content by measurement of He^+ ion resonant backscattering using (^4He + ^<16>O ⟶ ^<20>Ne^* ⟶ ^<16>O + ^4He) nuclear resonant reaction.
社団法人日本磁気学会の論文
2000-04-15