1-4 光学素子のための積層微細構造の製造(OS2-1 三次元の微細形状創成技術)

概要

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We introduced three types of new mass production methods for optical elements; iterative roller imprint of multilayered nanostructures, single-pass forming of nanostructures, and photolithography with multilayered resist film. In iterative roller imprint of nanostructures, in which two-dimensional structures are formed on a thin polymer sheet by mechanical pressing a nanostructured mold and the imprinted sheet is thermally bonded onto another one, four-layered nanostructures with 800-nm-pitch line-and-space pattern were fabricated. In single-pass forming of nanostructures, in which multilayered films are applied an impulse force by a nanostructured mold and sheared without plastic deformation, SiO_2 thin film was successfully shifted by using single-walled carbon nanotubes as a ground film. In photolithography with multilayered resist film, in which a three-dimensional periodic structure is fabricated from one-dimensional periodic structure of resist/non-resist films by two-dimensional periodic pattern exposure, three-layered nanostructures with 60-μm-pitch line-and-space pattern were fabricated.
一般社団法人日本機械学会の論文
2011-09-25