Indium-Tin-Oxide Thin Films Prepared by Dip Coating; Dependence of Resistivity on Film Thickness and Annealing Atmosphere : Surfaces, Interfaces, and Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-11-15
著者
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OGAWA Makoto
Department of Nuclear Engineering, School of Engineering, Tokai University
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SAWADA Yutaka
Department of Applied Chemistry, Tokyo Institute of Polytechnics
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Seki S
Department Of Industrial Chemistry Graduate School Of Engineering Tokyo Institute Of Polytechnics
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Sawada Y
Department Of Industrial Chemistry Graduate School Of Engineering Tokyo Institute Of Polytechnics
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Ogawa M
Department Of Industrial Chemistry Graduate School Of Engineering Tokyo Institute Of Polytechnic
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SEKI Shigeyuki
Department of Industrial Chemistry, Graduate School of Engineering, Tokyo Institute of Polytechnics
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Chen Kuei-hsien
Institute Of Atomic And Molecular Sciences Academia Sinica
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Ogawa Makoto
Department Of Earth Environment And Resources Sciences Graduate School Of Creative Science And Engin
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Sawada Yutaka
Department Of Applied Chemistry Faculty Of Engineering Tokyo Institute Of Polytechnics
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Wang Jih-hsiang
Optoelectronics And Systems Laboratories Industrial Technology Research Institute
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Ogawa Makoto
Department Mechanical Engineering Ii Shibaura Institute Of Technology
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Seki Shigeyuki
Department of Electronic Engineering, Sendai National College of Technology, 4-16-1 Ayashichuo, Aoba-ku, Sendai 989-3128, Japan
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