Stability of Sputter Deposited ZnO:Cr Films Against Acids

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概要

• 論文の詳細を見る

• ZnO:Cr films were deposited on water-cooled soda-lime glass substrates at room temperature in an Ar atmosphere by rf magnetron sputtering of a ZnO target on which Cr chips were placed. The films exhibited extraordinary stability against acids such as HCl or HNO_3, and also high resistivities similar to those of ZnO films. The addition of Cr suppressed the growth of ZnO grains which resulted in the formation of a dense film with a smooth surface. The stability and high resistivity displayed by the ZnO:Cr films can be attributed to the formation of a chromium-oxide-rich grain boundary.

• 社団法人応用物理学会の論文
• 1993-10-15

著者

• SAWADA Yutaka

  Department of Applied Chemistry, Tokyo Institute of Polytechnics

• MATSUMOTO Toshihiko

  Department of Applied Microbial Technology, Kumamoto Institute of Technology

• Nishide T

  Nissan Research Center Nissan Motor Co. Ltd.

• SHINODA Makoto

  Nissan Research Center, Nissan Motor Co., Ltd.

• NISHIDE Toshikazu

  Nissan Research Center, Nissan Motor Co., Ltd.

• HOSAKA Masato

  Department of Industrial Chemistry, Faculty of Engineering, Tokyo Institute of Polytechnics

• Hosaka Masato

  Department Of Industrial Chemistry Faculty Of Engineering Tokyo Institute Of Polytechnics

• Shinoda Makoto

  Nissan Research Center Nissan Motor Co. Ltd.

• Sawada Yutaka

  Department Of Applied Chemistry Faculty Of Engineering Tokyo Institute Of Polytechnics

• Matsumoto Toshihiko

  Department Of Applied Microbial Technology The Kumamoto Institute Of Technology

• MATSUMOTO Toshihiko

  Department of Industrial Chemistry, Faculty of Engineering, Tokyo Institute of Polytechnics

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