Development of Multichannel Ellipsometry with Synchronously Rotating Polarizer and Analyzer(Instrumentation, Measurement, and Fabrication Technology)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2002-06-15

著者

• Bang Kyung-yoon

  Department Of Physics Hanyang University

• An I

  Hanyang Univ. Kyunggi‐do Kor

• An Ilsin

  Department Of Applied Physics Hanyang University

• Park Myung-gyu

  Department Of Physics Hanyang University

• Oh Hye-keun

  Department Of Physics Hanyang University

• Oh Hye-keun

  Department Of Applied Physics Hanyang University

• KIM Hanjung

  Department of Control and Instrumentation, Hankyong National University

• Kim Hanjung

  Department Of Control And Instrumentation Hankyong National University

関連論文

• A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry
• Optical Properties of the SiO-Co Composite Thin Films
• Development of Multichannel Ellipsometry with Synchronously Rotating Polarizer and Analyzer(Instrumentation, Measurement, and Fabrication Technology)
• Characterization of 193 nm Chemically Amplified Resist during Post Exposure Bake and Post Exposure Delay
• Resist Reflow Modeling Including Surface Tension and Bulk Effect
• Mask Haze Measurement by Spectroscopic Ellipsometry
• 32 nm Half Pitch Formation with High-Numerical-Aperture Single Exposure
• Patterning of 32 nm $1:1$ Line and Space by Resist Reflow Process
• A Mask Generation Approach to Double Patterning Technology with Inverse Lithography
• Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask
• Critical Dimension Control for 32 nm Node Random Contact Hole Array Using Resist Reflow Process
• Photoresist Adhesion Effect of Resist Reflow Process
• Resist Reflow Modeling Including Surface Tension and Bulk Effect
• Resist Reflow Process for 32 nm Node Arbitrary Pattern
• Optical Investigation of Deep Ultraviolet Degradation of Pellicles
• Position Shift Analysis in Resist Reflow Process for Sub-50 nm Contact Hole
• Morphological Development and Etching of Gold Thin Film under UV-exposure in Chlorine-based Liquids
• Sensitivity of Simulation Parameter for Critical Dimension
• Heat Conduction to Photoresist on Top of Wafer during Post Exposure Bake Process: I. Numerical Approach
• Haze Defects due to Pellicle Adhesive
• Which Mask is Preferred for Sub-60 nm Node Imaging?
• Heat Conduction to Photoresist on Top of Wafer during Post Exposure Bake Process: II. Application
• Ellipsometry for Pellicle-Covered Surface
• Photoinduced Patterning of Gold Thin Film
• A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry
• Optical Properties of the SiO–Co Composite Thin Films
• Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry
• Transmission-Type Radio-Frequency Single-Electron Transistor with In-Plane-Gate Single-Electron Transistor
• Mask Haze Measurement by Spectroscopic Ellipsometry
• Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes
• Development of Calibration-Free Imaging Ellipsometry Using Dual-Rotation of Polarizer and Analyzer

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