Development of Calibration-Free Imaging Ellipsometry Using Dual-Rotation of Polarizer and Analyzer
スポンサーリンク
概要
- 論文の詳細を見る
Imaging ellipsometry is developed in the dual-rotation mode of a polarizer and an analyzer. In this system, the polarizer and analyzer are rotated by a stepping motor at $1:1$ ratio and the offset between the azimuths of both elements is kept constant. For data reduction, a two-dimensional array detector collects multiple intensity images during rotation and waveform analysis is performed for each pixel. This system generates second and fourth harmonics in intensity waveform and $\{\Delta, \Psi\}$ images are deduced from the amplitudes of these harmonics without considering their phases, which leads to calibration-free imaging ellipsometry. This system works well with an offset between two elements but it becomes less susceptible to an offset-setting error with a smaller offset. Besides the ease of operation, this system is simple to construct as no complicated control mechanism is required for each component.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-08-15
著者
-
An Ilsin
Department Of Applied Physics Hanyang University
-
Lee Eun-kyu
Department Of Anatomy And Cell Biology Institute Of Biomedical Science
-
Oh Hyekeun
Department of Applied Physics, Hanyang University, 1271 Sa-dong, Sangnok-gu, Ansan, Gyeonggi-do 426-791, Korea
-
Cheon Hyuknyeong
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
-
Bak Heung-Jin
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
関連論文
- A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry
- Optical Properties of the SiO-Co Composite Thin Films
- Development of Multichannel Ellipsometry with Synchronously Rotating Polarizer and Analyzer(Instrumentation, Measurement, and Fabrication Technology)
- Mask Haze Measurement by Spectroscopic Ellipsometry
- Patterning of 32 nm $1:1$ Line and Space by Resist Reflow Process
- A Mask Generation Approach to Double Patterning Technology with Inverse Lithography
- Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask
- Photoresist Adhesion Effect of Resist Reflow Process
- Resist Reflow Process for 32 nm Node Arbitrary Pattern
- Effects of Phellinus linteus Administration on Serotonin Synthesis in the Brain and Expression of Monocarboxylate Transporters in the Muscle during Exhaustive Exercise in Rats
- Optical Investigation of Deep Ultraviolet Degradation of Pellicles
- Essential roles of Toll-like receptor-4 signaling in arthritis induced by type II collagen antibody and LPS
- Morphological Development and Etching of Gold Thin Film under UV-exposure in Chlorine-based Liquids
- Ellipsometry for Pellicle-Covered Surface
- Photoinduced Patterning of Gold Thin Film
- A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry
- Optical Properties of the SiO–Co Composite Thin Films
- Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry
- Mask Haze Measurement by Spectroscopic Ellipsometry
- Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes
- Development of Calibration-Free Imaging Ellipsometry Using Dual-Rotation of Polarizer and Analyzer