An Ilsin | Department Of Applied Physics Hanyang University
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概要
関連著者
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An Ilsin
Department Of Applied Physics Hanyang University
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Oh Hye-keun
Department Of Applied Physics Hanyang University
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Kim Ok-kyung
Department Of Physics Hanyang University
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Oh Hye-keun
Department Of Physics Hanyang University
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Oh Hyekeun
Department of Applied Physics, Hanyang University, 1271 Sa-dong, Sangnok-gu, Ansan, Gyeonggi-do 426-791, Korea
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Park Joon-Min
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Bang Kyung-yoon
Department Of Physics Hanyang University
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Lee Jaeho
Department Of Biomaterial Science College Of Natural Resources & Life Science Pusan National Uni
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Bang Kyoung-yoon
Department Of Physics Hanyang University
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LEE Jaeho
Department of Computer Education, Gyeongin National University of Education
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Cho Han-koo
Samsung Electronics Co.
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Shin Dong-soo
Deparment Of Chemistry Changwon National University
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BANG Kyoung-Yoon
Department of Physics, Hanyang University
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Choi Chaungi
Corporated R&d Center Samsung Sdi Co. Ltd.
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Park Chang-won
Corporated R&d Center Samsung Sdi Co. Ltd.
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Seong Deokkyeong
Department Of Applied Physics Hanyang University
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Jeong Heejun
Department Of Applied Physics Hanyang University
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Hong Joo-Yoo
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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An Ilsin
Department of Physics, Hanyang University, Ansan 425-791, Korea
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Kim Young-hoon
Samsung Electronics Co.
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An I
Hanyang Univ. Kyunggi‐do Kor
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Lee Jaeho
Department Of Physics Hanyang University
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Park Myung-gyu
Department Of Physics Hanyang University
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Kim Sung-hyuck
Samsung Electronics Co. Ltd.
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Kim Sung-hyuck
Samsung Electronics Co.
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CHOI Chaungi
Corporated R&D Center, Samsung SDI Co., Ltd.
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PARK Chang-Won
Corporated R&D Center, Samsung SDI Co., Ltd.
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KIM Hanjung
Department of Control and Instrumentation, Hankyong National University
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Kim Hanjung
Department Of Control And Instrumentation Hankyong National University
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An Ilsin
Department Of Physics Hanyang University
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Kim Eun-jin
Department Of Physiology Institute Of Health Sciences Gyeongsang National University School Of Medic
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Lee Eun-kyu
Department Of Anatomy And Cell Biology Institute Of Biomedical Science
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SEONG Deokkyeong
Department of Applied Physics, Hanyang University
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Shin Dong-Soo
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Kang Young-Min
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Bang Kyoung-Yoon
Department of Physics, Hanyang University, Ansan 425-791, Korea
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Bang Kyungyoon
Department of Physics, Hanyang University, Ansan, Korea
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Kyoung Jaesun
Department of Physics, Hanyang University, Ansan, Korea
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Oh Hyekeun
Department of Physics, Hanyang University, Ansan, Korea
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Lee Iksoo
Samsung Electronics, Giheung, Korea
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Kim Hochul
Samsung Electronics, Suwon, Korea
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Jeon Dong
Department of Physics Education and Nano Systems Institute, Seoul National University, Seoul, Korea
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Oh Hyekeun
Department of Applied Physics, Hanyang University, Ansan, Korea
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Oh Hye-Keun
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Oh Hye-Keun
Department of Applied Physics, Hanyang University, Ansan, Kyunggi-Do 426-791, Korea
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Oh Hye-Keun
Department of Physics, Hanyang University, Ansan 425-791, Korea
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Kim Youngsang
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Jeong Heejun
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Jeong Heejun
Department of Applied Physics, Hanyang University, 1271 Sa-dong, Sangnok-gu, Ansan, Gyeonggi-do 426-791, Korea
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Lee Sangyouk
Department of Applied Physics, Hanyang University, 1271 Sa-dong, Sangnok-gu, Ansan, Gyeonggi-do 426-791, Korea
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Kyoung Jaisun
Department of Applied Physics, Hanyang University, 1271 Sa-dong, Sangnok-gu, Ansan, Gyeonggi-do 426-791, Korea
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Song Chulgi
Process Analysis and Control Group, Samsung Electronics Co., Hwasung, Gyeonggi-do 445-701, Korea
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Lee Jaeho
Department of Physics, Hanyang University, Ansan 425-791, Korea
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Cheon Hyuknyeong
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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An Ilsin
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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An Ilsin
Department of Applied Physics, Hanyang University, Ansan, Kyunggi-Do 426-791, Korea
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An Ilsin
Department of Applied Physics, Hanyang University, 1271 Sa-dong, Sangnok-gu, Ansan, Gyeonggi-do 426-791, Korea
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An Ilsin
Department of Physics, Hanyang University, Ansan, Korea
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Kim Ok-Kyung
Department of Physics, Hanyang University, Ansan 425-791, Korea
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Kim Sang-Kon
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Juno Young-Dae
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Kim Young-Hoon
Department of Applied Physics, Hanyang University, Ansan, Kyunggi-Do 426-791, Korea
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Kim Eun-Jin
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Kim Sung-Hyuck
Samsung Electronics Co., San #24 Nongseo-Ri, Giheung-Eup, Yongin-City, Gyeonggi-Do 449-711, Korea
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Kim Dai-Gyoung
Department of Applied Mathematics, Hanyang University, Ansan 426-791, Korea
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Seong Deokkyeong
Department of Applied Physics, Hanyang University, Ansan, Korea
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KIM Eun-jin
Department of Applied Mathematics, University of Sheffield, Sheffield, S3 7RH, U.K.
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Bak Heung-Jin
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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An Ilsin
Department of Applied Physics, Hanyang University, Ansan, Korea
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Choi Chaungi
Corporated R&D Center, Samsung SDI Co., Ltd., Youngin 442-902, Korea
著作論文
- A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry
- Optical Properties of the SiO-Co Composite Thin Films
- Development of Multichannel Ellipsometry with Synchronously Rotating Polarizer and Analyzer(Instrumentation, Measurement, and Fabrication Technology)
- Mask Haze Measurement by Spectroscopic Ellipsometry
- Patterning of 32 nm $1:1$ Line and Space by Resist Reflow Process
- A Mask Generation Approach to Double Patterning Technology with Inverse Lithography
- Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask
- Photoresist Adhesion Effect of Resist Reflow Process
- Resist Reflow Process for 32 nm Node Arbitrary Pattern
- Morphological Development and Etching of Gold Thin Film under UV-exposure in Chlorine-based Liquids
- Ellipsometry for Pellicle-Covered Surface
- Photoinduced Patterning of Gold Thin Film
- A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry
- Optical Properties of the SiO–Co Composite Thin Films
- Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry
- Mask Haze Measurement by Spectroscopic Ellipsometry
- Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes
- Development of Calibration-Free Imaging Ellipsometry Using Dual-Rotation of Polarizer and Analyzer