Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry

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概要

• 論文の詳細を見る

• Rotating compensator spectroscopic ellipsometry was used to study the optical properties of a rubbed polyimide layer. Two operating modes in the transmission configuration were studied. One was a conventional mode of 'polarizer–sample–rotating compensator–analyzer'. The other was a dual rotation mode of 'polarizer–rotating sample–rotating compensator–analyzer'. We found that calibration is not possible in the conventional mode due to the extremely small retardance and non-dichroic nature of the sample. Meanwhile, in dual rotation mode which we developed, a retardance smaller than 0.5° could be measured without calibration. Using this technique, the variation in retardance with rubbing could be easily determined over a range of 320–800 nm. The optical axis could also be determined with high precision for this sample, and this optical axis was found to be parallel to the direction of rubbing.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-10-15

著者

• An Ilsin

  Department Of Applied Physics Hanyang University

• Bang Kyungyoon

  Department of Physics, Hanyang University, Ansan, Korea

• Kyoung Jaesun

  Department of Physics, Hanyang University, Ansan, Korea

• Oh Hyekeun

  Department of Physics, Hanyang University, Ansan, Korea

• Lee Iksoo

  Samsung Electronics, Giheung, Korea

• Kim Hochul

  Samsung Electronics, Suwon, Korea

• Jeon Dong

  Department of Physics Education and Nano Systems Institute, Seoul National University, Seoul, Korea

• Oh Hyekeun

  Department of Applied Physics, Hanyang University, 1271 Sa-dong, Sangnok-gu, Ansan, Gyeonggi-do 426-791, Korea

• An Ilsin

  Department of Physics, Hanyang University, Ansan, Korea

関連論文

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• Development of Multichannel Ellipsometry with Synchronously Rotating Polarizer and Analyzer(Instrumentation, Measurement, and Fabrication Technology)
• Mask Haze Measurement by Spectroscopic Ellipsometry
• Patterning of 32 nm $1:1$ Line and Space by Resist Reflow Process
• A Mask Generation Approach to Double Patterning Technology with Inverse Lithography
• Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask
• Photoresist Adhesion Effect of Resist Reflow Process
• Resist Reflow Process for 32 nm Node Arbitrary Pattern
• Morphological Development and Etching of Gold Thin Film under UV-exposure in Chlorine-based Liquids
• Ellipsometry for Pellicle-Covered Surface
• Photoinduced Patterning of Gold Thin Film
• A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry
• Optical Properties of the SiO–Co Composite Thin Films
• Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry
• Mask Haze Measurement by Spectroscopic Ellipsometry
• Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes
• Development of Calibration-Free Imaging Ellipsometry Using Dual-Rotation of Polarizer and Analyzer

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