Mask Haze Measurement by Spectroscopic Ellipsometry

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2006-06-30

著者

• Kim Young-hoon

  Samsung Electronics Co.

• Cho Han-koo

  Samsung Electronics Co.

• An Ilsin

  Department Of Applied Physics Hanyang University

• Oh Hye-keun

  Department Of Physics Hanyang University

• Kim Sung-hyuck

  Samsung Electronics Co. Ltd.

関連論文

• A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry
• Optical Properties of the SiO-Co Composite Thin Films
• Development of Multichannel Ellipsometry with Synchronously Rotating Polarizer and Analyzer(Instrumentation, Measurement, and Fabrication Technology)
• Characterization of 193 nm Chemically Amplified Resist during Post Exposure Bake and Post Exposure Delay
• Resist Reflow Modeling Including Surface Tension and Bulk Effect
• Mask Haze Measurement by Spectroscopic Ellipsometry
• Patterning of 32 nm $1:1$ Line and Space by Resist Reflow Process
• A Mask Generation Approach to Double Patterning Technology with Inverse Lithography
• Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask
• Photoresist Adhesion Effect of Resist Reflow Process
• Resist Reflow Process for 32 nm Node Arbitrary Pattern
• Morphological Development and Etching of Gold Thin Film under UV-exposure in Chlorine-based Liquids
• Ellipsometry for Pellicle-Covered Surface
• Photoinduced Patterning of Gold Thin Film
• A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry
• Optical Properties of the SiO–Co Composite Thin Films
• Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry
• Mask Haze Measurement by Spectroscopic Ellipsometry
• Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes
• Development of Calibration-Free Imaging Ellipsometry Using Dual-Rotation of Polarizer and Analyzer

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