Photoinduced Patterning of Gold Thin Film
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概要
- 論文の詳細を見る
We report a novel etching technique for gold film based on a new phenomenon that gold is soluble in chlorine-containing solutions or solvents under UV irradiation. This is a promising method for gold patterning possibly in microdevice or nanodevice fabrication. Mask patterns can be transferred to a gold surface directly without resorting to a complex photoresist process, and etch rate can be controlled from sub-nanometer to a few tens of nanometers per minute by adjusting exposure parameters. Moreover, nontoxic liquid such as NaCl solution can be used for the process.
- 2004-08-15
著者
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An Ilsin
Department Of Applied Physics Hanyang University
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Seong Deokkyeong
Department Of Applied Physics Hanyang University
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Oh Hyekeun
Department of Applied Physics, Hanyang University, 1271 Sa-dong, Sangnok-gu, Ansan, Gyeonggi-do 426-791, Korea
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Oh Hyekeun
Department of Applied Physics, Hanyang University, Ansan, Korea
-
Seong Deokkyeong
Department of Applied Physics, Hanyang University, Ansan, Korea
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An Ilsin
Department of Applied Physics, Hanyang University, Ansan, Korea
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