Oh Hye-keun | Department Of Applied Physics Hanyang University
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概要
関連著者
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Oh Hye-keun
Department Of Applied Physics Hanyang University
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An Ilsin
Department Of Applied Physics Hanyang University
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Park Joon-Min
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Hong Joo-Yoo
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Kim Ok-kyung
Department Of Physics Hanyang University
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Lee Jaeho
Department Of Biomaterial Science College Of Natural Resources & Life Science Pusan National Uni
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Oh Hye-keun
Department Of Physics Hanyang University
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Bang Kyoung-yoon
Department Of Physics Hanyang University
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Kang Young-Min
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Bang Kyung-yoon
Department Of Physics Hanyang University
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Lee Ji-eun
Department Of Applied Physics Hanyang University
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Choi Chaungi
Corporated R&d Center Samsung Sdi Co. Ltd.
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Park Chang-won
Corporated R&d Center Samsung Sdi Co. Ltd.
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Park Seung-wook
Department Of Applied Physics Hanyang University
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Jeong Heejun
Department Of Applied Physics Hanyang University
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Kim Do
Department Of Applied Mathematics College Of Natural Sciences National Fisheries University Of Pusan
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Oh Hye-Keun
Department of Applied Physics, Hanyang University, Ansan 426-791, Republic of Korea
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An Ilsin
Department of Physics, Hanyang University, Ansan 425-791, Korea
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Kim Sang-Kon
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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LEE Jaeho
Department of Computer Education, Gyeongin National University of Education
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LEE Eun-Mi
Physics Department, Hanyang University
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LEE Young-Mi
Physics Department, Hanyang University
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LEE Young-Mi
Department of Oriental Pharmacy, College of Pharmacy, Wonkwang University
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LEE Eun-Mi
Department of Microbiology, College of Medicine, Konkuk University
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SOHN Young-Soo
Department of Electrical Engineering, Pohang University of Science and Technology
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Lee Young-mi
Physics Department Hanyang University
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Lee Eun-mi
Physics Department Hanyang University
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Cho Han-koo
Samsung Electronics Co.
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Park Jun-min
Department Of Applied Physics Hanyang University
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An I
Hanyang Univ. Kyunggi‐do Kor
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Sung Moon-gyu
Department Of Physics Hanyang University
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Lee Jaeho
Department Of Physics Hanyang University
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Lee Eun-mi
Department Of Dentistry Kyungpook National University Hospital
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Sohn Young-soo
Department Of Electrical Engineering Pohang University Of Science And Technology
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Sohn Young-soo
Physics Department Hanyang University
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Park Myung-gyu
Department Of Physics Hanyang University
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Oh Hye-keun
Physics Department Hanyang University
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Lee Young-mi
Department Of Nursing Hanbuk University
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Shin Dong-soo
Deparment Of Chemistry Changwon National University
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Kim Sung-hyuck
Photomask Team Samsung Electronic Co. Ltd.
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Kim Sung-hyuck
Samsung Electronics Co.
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BANG Kyoung-Yoon
Department of Physics, Hanyang University
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CHOI Chaungi
Corporated R&D Center, Samsung SDI Co., Ltd.
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PARK Chang-Won
Corporated R&D Center, Samsung SDI Co., Ltd.
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KIM Hanjung
Department of Control and Instrumentation, Hankyong National University
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Kim Kang
Department Of Computational Molecular Science Institute For Molecular Science
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Oh Hye-keu
Department Of Physics Hanyang University
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Kim Hanjung
Department Of Control And Instrumentation Hankyong National University
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An Ilsin
Department Of Physics Hanyang University
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LEE Sung-Muk
Department of Physics Education, Seoul National University
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Oh H‐k
Physics Department Hanyang University
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Kim Sang-kon
Department Of Physics Hanyang University
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Kim Eun-jin
Department Of Physiology Institute Of Health Sciences Gyeongsang National University School Of Medic
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Lee Eun-mi
Department Of Environmental Engineering Seoul National Polytechnic University
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Shin Dong-Soo
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Bang Kyoung-Yoon
Department of Physics, Hanyang University, Ansan 425-791, Korea
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Lee Jeung-Woo
Photomask Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Hwasung, Gyenggi 445-701, Korea
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You Jee-Hye
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Hye-Keun Oh
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Kim Do
Department of Applied Mathematics, Hanyang University, Ansan 426-791, Republic of Korea
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Oh Hye-Keun
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Oh Hye-Keun
Department of Applied Physics, Hanyang University, Ansan, Kyunggi-Do 426-791, Korea
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Oh Hye-Keun
Department of Applied Physics, Hanyang University, Ansan, Gyenggi 426-791, Korea
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Oh Hye-Keun
Department of Physics, Hanyang University, Ansan 425-791, Korea
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Oh Hye-Keun
Department of Applied Physics, Hanyang University, Sa-1 Dong, Ansan 426-791, Korea
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Kim Soon-Ho
Photomask Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Hwasung, Gyenggi 445-701, Korea
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Kim Yong-Hoon
Photomask Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Hwasung, Gyenggi 445-701, Korea
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Woo Sang-Gyun
Photomask Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Hwasung, Gyenggi 445-701, Korea
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Cho Han-Ku
Photomask Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Hwasung, Gyenggi 445-701, Korea
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Kim Youngsang
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Lee Jj-Eun
Department of Applied Physics, Hanyang University, Ansan 426-791, Republic of Korea
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Jeong Heejun
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Kim Soon-Ho
Photomask Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Hwasung, Gyenggi 445-701, Korea
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Woo Sang-Gyun
Photomask Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Hwasung, Gyenggi 445-701, Korea
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Park Joonwoo
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Lee Jaeho
Department of Physics, Hanyang University, Ansan 425-791, Korea
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Cho Han-Ku
Photomask Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Hwasung, Gyenggi 445-701, Korea
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Lee Ji-Eun
Department of Applied Physics, Hanyang University, Ansan 426-791, Republic of Korea
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Cheon Hyuknyeong
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Hyuknyeong Cheon
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Kim Kang
Department of Applied Physics, Hanyang University, Sa-1 Dong, Ansan 426-791, Korea
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Choi Hyungseok
Manufacturing Technology Team, Samsung Electronics Co., Hwasung 445-701, Korea
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Ilsin An
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Lee Ji-Eun
Department of Applied Physics, Hanyang University, Sa-1 Dong, Ansan 426-791, Korea
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An Ilsin
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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An Ilsin
Department of Applied Physics, Hanyang University, Ansan, Kyunggi-Do 426-791, Korea
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Hyungseok Choi
Manufacturing Technology Team, Samsung Electronics Co., Hwasung 445-701, Korea
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Kim Ok-Kyung
Department of Physics, Hanyang University, Ansan 425-791, Korea
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Juno Young-Dae
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Kim Young-Hoon
Department of Applied Physics, Hanyang University, Ansan, Kyunggi-Do 426-791, Korea
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Park Jun-Min
Department of Applied Physics, Hanyang University, Sa-1 Dong, Ansan 426-791, Korea
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Kim Eun-Jin
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Kim Sung-Hyuck
Samsung Electronics Co., San #24 Nongseo-Ri, Giheung-Eup, Yongin-City, Gyeonggi-Do 449-711, Korea
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Kim Sung-Hyuck
Photomask Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Hwasung, Gyenggi 445-701, Korea
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Kim Dai-Gyoung
Department of Applied Mathematics, Hanyang University, Ansan 426-791, Korea
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Kim Yong-Hoon
Photomask Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Hwasung, Gyenggi 445-701, Korea
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KIM Eun-jin
Department of Applied Mathematics, University of Sheffield, Sheffield, S3 7RH, U.K.
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Jung Minhee
Department of Applied Physics, Hanyang University, Ansan 426-791, Korea
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Choi Chaungi
Corporated R&D Center, Samsung SDI Co., Ltd., Youngin 442-902, Korea
著作論文
- Optical Properties of the SiO-Co Composite Thin Films
- Development of Multichannel Ellipsometry with Synchronously Rotating Polarizer and Analyzer(Instrumentation, Measurement, and Fabrication Technology)
- Characterization of 193 nm Chemically Amplified Resist during Post Exposure Bake and Post Exposure Delay
- 32 nm Half Pitch Formation with High-Numerical-Aperture Single Exposure
- Patterning of 32 nm $1:1$ Line and Space by Resist Reflow Process
- A Mask Generation Approach to Double Patterning Technology with Inverse Lithography
- Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask
- Critical Dimension Control for 32 nm Node Random Contact Hole Array Using Resist Reflow Process
- Photoresist Adhesion Effect of Resist Reflow Process
- Resist Reflow Modeling Including Surface Tension and Bulk Effect
- Resist Reflow Process for 32 nm Node Arbitrary Pattern
- Optical Investigation of Deep Ultraviolet Degradation of Pellicles
- Position Shift Analysis in Resist Reflow Process for Sub-50 nm Contact Hole
- Sensitivity of Simulation Parameter for Critical Dimension
- Heat Conduction to Photoresist on Top of Wafer during Post Exposure Bake Process: I. Numerical Approach
- Haze Defects due to Pellicle Adhesive
- Which Mask is Preferred for Sub-60 nm Node Imaging?
- Heat Conduction to Photoresist on Top of Wafer during Post Exposure Bake Process: II. Application
- A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry
- Optical Properties of the SiO–Co Composite Thin Films
- Mask Haze Measurement by Spectroscopic Ellipsometry
- Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes