Residual Strain in Semi-Insulating InP Wafers Treated by Multiple-Step Wafer Annealing
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-02-28
著者
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YAMADA Masayoshi
Department of Electronics,Faculty of Engineering,Kobe University
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FUKUZAWA Masayuki
Department of Electronics and Information Science, Kyoto Institute of Technology
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Oda Osamu
Materials And Components Laboratories Japan Energy Corporation
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Yamada Masayoshi
Department Of Electronics Faculty Of Engineering Osaka University
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HERMS Martin
Department of Electronics and Information Science, Kyoto Institute of Technology
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UCHIDA Masayuki
Materials and Components Laboratories, Japan Energy Corporation
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Herms Martin
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Fukuzawa Masayuki
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Uchida Masayuki
Materials And Components Laboratories Japan Energy Corporation
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Yamada Masayoshi
Department Of Electronics And Information Science Faculty Of Engineering And Design Kyoto Institute
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